US9422952: Vortex diodes as effluent treatment devices
The invention discloses device that can generate a strong vortex in the vortex chamber which significantly enhances rate of reactions and effectiveness of wastewater treatment. The invention discloses vortex diodes with or without inserts/stabilizers as continuous flow reactors to induce cavitation to generate radicals which reduce Chemical Oxygen Demand (COD), ammoniacal nitrogen and color of wastewater effectively in effluent treatments.
Patent No:
US9422952
Application No:
14/351124
Filing Date:
10-04-2014
Issue Date:
23-08-2016
Applicant:
CSIR-National Chemical Laboratory (CSIR-NCL), Pune
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