US9422952: Vortex diodes as effluent treatment devices

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The invention discloses device that can generate a strong vortex in the vortex chamber which significantly enhances rate of reactions and effectiveness of wastewater treatment. The invention discloses vortex diodes with or without inserts/stabilizers as continuous flow reactors to induce cavitation to generate radicals which reduce Chemical Oxygen Demand (COD), ammoniacal nitrogen and color of wastewater effectively in effluent treatments.

Patent No:: US9422952
Application No:: 14/351124
Filing Date:: 10-04-2014
Issue Date:: 23-08-2016
Applicant:: CSIR-National Chemical Laboratory (CSIR-NCL), Pune
Inventor(s):: Vivek Vinayak Ranade; Amol Arvind Kulkarni; Vinay Manoharrao Bhandari
IPC Classification:: C02F 1/72, F15C 1/16, C02F 9/00, C02F 3/28, C02F 1/34, F15D 1/00, C02F 1/52, C02F 1/78, C02F 3/02
Country:: United States of America

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