FR2766314: Vortex diodes as reactors and effluent treatment devices
The invention discloses device that can generate a strong vortex in the vortex chamber which significantly enhances rate of reactions and effectiveness of wastewater treatment. The invention discloses vortex diodes with or without inserts/stabilizers as continuous flow reactors to induce cavitation to generate radicals which reduce Chemical Oxygen Demand (COD), ammoniacal nitrogen and color of wastewater effectively in effluent treatments.
Patent No:
FR2766314
Application No:
12795083
Filing Date:
22-04-2014
Issue Date:
03-04-2019
Applicant:
CSIR-National Chemical Laboratory (CSIR-NCL), Pune
Disclaimer:
Information available on this portal is sourced from various organizations and is provided for informational purposes only. Users are advised to verify details from the respective official sources.
Please enter your details
Please provide your name and email to continue. Your details are saved in this browser for future use.
Latest Updates
Loading…
⚠️
You are leaving this website
You are about to be redirected to an external website that is not operated by
India Science, Technology & Innovation (ISTI) Portal.