×

img Acces sibility Controls

Patents Banner

Patents

FR2766314: Vortex diodes as reactors and effluent treatment devices

The invention discloses device that can generate a strong vortex in the vortex chamber which significantly enhances rate of reactions and effectiveness of wastewater treatment. The invention discloses vortex diodes with or without inserts/stabilizers as continuous flow reactors to induce cavitation to generate radicals which reduce Chemical Oxygen Demand (COD), ammoniacal nitrogen and color of wastewater effectively in effluent treatments.
Patent No:
FR2766314
Application No:
12795083
Filing Date:
22-04-2014
Issue Date:
03-04-2019
Applicant:
CSIR-National Chemical Laboratory (CSIR-NCL), Pune
Inventor(s):
Vivek Vinayak Ranade; Amol Arvind Kulkarni; Vinay Manoharrao Bhandari
Country:
France
Disclaimer: Information available on this portal is sourced from various organizations and is provided for informational purposes only. Users are advised to verify details from the respective official sources.
arrowtop
Latest Updates
Loading…