US9725338: Vortex diodes as reactors and effluent treatment devices
The invention discloses device that can generate a strong vortex in the vortex chamber which significantly enhances rate of reactions and effectiveness of wastewater treatment. The invention discloses vortex diodes with or without inserts/stabilizers as continuous flow reactors to induce cavitation to generate radicals which reduce Chemical Oxygen Demand (COD), ammoniacal nitrogen and color of wastewater effectively in effluent treatments.
Patent No:
US9725338
Application No:
15/227428
Filing Date:
03-08-2016
Issue Date:
08-08-2017
Applicant:
CSIR-National Chemical Laboratory (CSIR-NCL), Pune
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