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US7763688: Soluble polymers comprising unsaturation and process for preparation thereof

The invention describes the synthesis of solvent-soluble copolymers containing multiple unsaturations. These copolymers contain reactive vinyl groups, which can be further reacted in a second-stage polymerisation. The process involves the copolymerisation of a vinyl monomer with an inclusion complex of a monomer having multiple unsaturations and a cyclic macromolecular compound to yield soluble polymers. These polymers may be cast into films, membranes or may be converted into micro or nanoparticles and then crosslinked in a second step polymerisation.
Patent No:
US7763688
Application No:
12/257996
Filing Date:
24-10-2008
Issue Date:
27-07-2010
Applicant:
CSIR-National Chemical Laboratory (CSIR-NCL), Pune
Inventor(s):
Kulkarni, Mohan G. (Pune, In); Karmalkar, Rohini N. (Pune, In); Satav, Sunita S. (Pune, In)
IPC Classification:
C08F 2/06, C08B 37/16
Country:
United States of America
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