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Development of two types of post etch residue strippers suitable for cleaning and removal of residues after plasma etching & photo resist ashing of metal & dielectric layers

Implementing Organization

lndian Institute of Technology (IIT) DeIhi
Principal Investigator
Dr. Subrata Ghosh
Associate Professor, School of Basic Sciences, Indian Institute of Technology (IIT) Mandi, Himachal Pradesh

Project Overview

NA

Achievements

NA

Related Research

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Funding Organization
Funding Organization
Semi-Conductor Laboratory (SCL), Mohali
Quick Information
Area of Research
Chemical Sciences
Focus Area
Residue strippers
Start Date
2018
End Date
2020
Sanction Amount
₹ 39.00 L
Status
Completed
Contact
subrata@iitmandi.ac.in
Output
No. of Research Paper
00
Technologies (If Any)
00
No. of PhD Produced
NA
Publications
00
No. of Patents
Filed : 00
Grant : 00
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