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Development of indigenous DUV photoresists for 180 nm process technology at semi-conductor lab (SCL) mandi: Make in India SCL Mohali

Funding Organization
Funding Organization

Quick Information
Area of Research
Physical Sciences
Focus Area
Photolithography
Start Year
2015
End Year
2019
Sanction Amount
₹ 81.00 L
Status
Completed
Output
No. of Research Paper
00
Technologies (If Any)
00
No. of PhD Produced
N/A
Startup (If Any)
00
No. of Patents
Filed :00
Grant :00
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