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Development of two types of post etch residue strippers suitable for cleaning and removal of residues after plasma etching & photo resist ashing of metal & dielectric layers

Implementing Organization

Indian Institute of Technology (IIT), Mandi, Himachal Pradesh
Principal Investigator
Dr. Subrata Ghosh
Associate Professor
|
Indian Institute of Technology (IIT) Mandi, Himachal Pradesh
School of Basic Sciences

Related Research

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Funding Organization
Funding Organization
Semi-Conductor Laboratory (SCL), Mohali
Quick Information
Area of Research
Life Sciences & Biotechnology
Focus Area
Residue strippers
Start Year
2018
End Year
2020
Sanction Amount
₹ 39.00 L
Status
Completed
Output
No. of Research Paper
00
Technologies (If Any)
00
No. of PhD Produced
N/A
Startup (If Any)
00
No. of Patents
Filed :00
Grant :00
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