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Next Generation, Cutting-Edge Indigenous EUVL Resist Technology for Semiconductor Industry

Funding Organization
Funding Organization
Department of Science and Technology (DST)
Quick Information
Area of Research
Engineering Sciences
Focus Area
EUVL Resist Technology
Start Year
2016
End Year
2019
Sanction Amount
₹ 91.87 L
Status
Completed
Output
No. of Research Paper
00
Technologies (If Any)
00
No. of PhD Produced
N/A
Startup (If Any)
00
No. of Patents
Filed :00
Grant :00
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