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Wide Bandgap Semiconductor (Al)GaO/Nitrides Heterostructures for High Power Electronic and Optoelectronic Devices Wide Bandgap Semiconductor (Al)GaO/Nitrides Heterostructures for High Power Electronic and Optoelectronic Devices Wide Bandgap Semiconductor (Al)GaO/Nitrides Heterostructures for High Power Electronic and Optoelectronic Devices Wide Ban

Implementing Organization

Indian Institute of Technology (IIT)
Principal Investigator
Prof. Rajendra Singh
Indian Institute of Technology (IIT)

Project Overview

Ga2O3, a wide bandgap semiconductor with a large breakdown field, has gained interest for high-power devices and solar-blind photodetectors.

This project aims to synthesize and study new materials and heterostructures based on group-IIIAl, Ga, In-oxide, and nitride compounds, primarily AlxGa1-x2O3/AlyGa1-yN, using the MOCVD technique. The development of technological approaches will enhance the performance of high-power electronics, including SBD, MOSFET, HEMT, and high-sensitivity solar-blind photodetectors. The project will develop mathematical modeling for growth, new technological methods for high-quality material growth, and theoretical calculations for power devices and photodetectors. The project targets high power density of SBD transistors, MOSFETs, HEMTs, and solar-blind photodetectors, with potential applications in energy-efficient high power switching diodes and MESFETs.

Funding Organization
Funding Organization
Department of Science and Technology (DST)
Quick Information
Area of Research
Material Sciences
Focus Area
Device Fabrication and Integration
Start Year
2023
End Year
2026
Sanction Amount
₹ 45.26 L
Status
Ongoing
Output
No. of Research Paper
00
Technologies (If Any)
00
No. of PhD Produced
N/A
Startup (If Any)
00
No. of Patents
Filed :00
Grant :00
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