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Fully-printed, flexible negative capacitance field-effect transistors (nc-FETs) and logics

Implementing Organization

Indian Institute of Science
Principal Investigator
Dr. subho Dasgupta
Indian Institute of Science

About

Moore's law of device miniaturization is reaching its limit, but low-power, high-speed transistors are crucial for emerging electronic applications like IoT platforms and portable electronics. salahuddin and Datta proposed rapid switching in FETs using a dielectric or ferroelectric stack to stabilize a negative capacitance region. This allows for ultra-low subthreshold slope (ss) values, which are limited by the Boltzmann barrier. nc-FETs, which offer subthermionic transport, have gained interest in experimental demonstrations. Typically, literature reports include vacuum-deposited devices with -20 mV or dec ss values. However, there is no literature report on solution-processed nc-FETs. This project aims to demonstrate fully-printed nc-FETs and complex circuits based on them. The project will first fabricate printed 2D and oxide semiconductor-based nc-FETs on PEN or parylene substrates with organic polyvinyl alcohol (PVA) and plyvinyledene fluoride-trifluoroethylene (PVDF-TrFE) dielectric or ferroelectric, demonstrating their bending strain tolerance. superior devices will be fabricated by replacing PVA with Al2O3 and PVDF-TrFE with suitable oxide ferroelectrics. The goal is to demonstrate ultra-low leakage and long-term stability of the charged state for printed memory applications.

Source

Source
science and Engineering Research Board (sERB), DsT
Funding Organization
Funding Organization
Anusandhan National Research Foundation (ANRF)
Quick Information
Area of Research
Engineering Sciences
Focus Area
Material sciences
Start Year
2024
End Year
2027
Sanction Amount
₹ 65.30 L
Status
Ongoing
Contact
dasgupta@iisc.ac.in
Output
No. of Research Paper
00
Technologies (If Any)
00
No. of PhD Produced
00
No. of Patents
Filed : 00
Grant : 00
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