Wide Bandgap Semiconductor (Al)GaO/Nitrides Heterostructures for High Power Electronic and Optoelectronic Devices Wide Bandgap Semiconductor (Al)GaO/Nitrides Heterostructures for High Power Electronic and Optoelectronic Devices Wide Bandgap Semiconductor (Al)GaO/Nitrides Heterostructures for High Power Electronic and Optoelectronic Devices Wide Ban
Implementing Organization
Indian Institute of Technology (IIT)
Principal Investigator
Prof. Rajendra Singh
Indian Institute of Technology (IIT)
Project Overview
Ga2O3, a wide bandgap semiconductor with a large breakdown field, has gained interest for high-power devices and solar-blind photodetectors. However, doping Ga2O3 as p-type with shallow acceptors is challenging. III-nitride semiconductors, which can be easily doped in both n- and p-type, could provide a unique device architecture. Metalorganic Chemical Vapor Deposition (MCVD) is still in its infancy for producing high-quality hetero-epitaxial oxide films, but molecular beam epitaxy is promising for future mass production and nitride/oxide heterostructure fabrication.
This project aims to synthesize and study new materials and heterostructures based on group-IIIAl, Ga, In-oxide, and nitride compounds, primarily AlxGa1-x2O3/AlyGa1-yN, using the MOCVD technique. The development of technological approaches will enhance the performance of high-power electronics, including SBD, MOSFET, HEMT, and high-sensitivity solar-blind photodetectors. The project will develop mathematical modeling for growth, new technological methods for high-quality material growth, and theoretical calculations for power devices and photodetectors. The project targets high power density of SBD transistors, MOSFETs, HEMTs, and solar-blind photodetectors, with potential applications in energy-efficient high power switching diodes and MESFETs.