Embedding Ferroelectric Hafnium-Zirconium oxide (HZO) in gate stack of GaN based Junctionless Transistor
Implementing Organization
University of Delhi
Principal Investigator
Dr. Kajal Jindal
University of Delhi
CO-Principal Investigator
Prof. Arijit Chowdhuri
Acharya Narendra Dev College, Delhi-110019
CO-Principal Investigator
Dr. Abhinav Kranti
Indian Institute of Technology (IIT)
CO-Principal Investigator
Dr. Monika Tomar
Miranda House, Delhi
About
Semiconductor devices, such as MOSFETs and HEMTs, are crucial in various applications such as wireless communication systems, mobile devices, integrated circuits, and defense systems. Recently, research has focused on the realization of Junctionless Transistors (JLTs) due to their simple design and miniaturization possibilities over conventional MOSFETs. JLTs eliminate problems such as threshold-adjust and low drain-source, leading to the possibility of pocket implants. The main advantage of JLTs is that no n-n, p-p, or p-n junction is required for transistor action. JLTs have been proposed in recent decades, including Tunnel FET, Single Gate, Thin Film, Double Gate, and FinFET. They have an edge as the subthreshold slope can be reduced below 60 mV/dec, leading to faster switching capability and low power operation. JLT structures have been developed for use in microwave power amplifiers and switching electronics signals in electronic devices. India is still dependent on foreign input for semiconductor chips, and the government is focusing on establishing the semiconductor industry in the country. The proposal aims to fabricate a GaN-based junctionless transisitor integrated with ferroelectric HZO in the gate stack, with specific objectives including growth and optimization of HZO and dielectric layer Al2O3 thin film, embedding HZO in the gate stack, studying metal electrodes for gate, drain, and source contacts, and conducting electrical measurements and validation using theoretical modeling/simulation.
Source
Source
Anusandhan National Research Foundation/Science and Engineering Research Board (SERB), DST 2023-24
Science and Engineering Research Board (SERB), New Delhi
Anusandhan National Research Foundation (ANRF)
Quick Information
Area of Research
Physical Sciences
Start Year
2024
End Year
2027
Sanction Amount
₹ 31.93 L
Status
Ongoing
Contact
kajalmh18@kmc.du.ac.in
Output
No. of Research Paper
00
Technologies (If Any)
00
No. of PhD Produced
00
No. of Patents
Filed :00
Grant :00
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