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synthesis of Intelligent Nanostructured Materials via a Plasma source based Digital Nano-manufacturing Method and their Characterization

Implementing Organization

National Institute of Technology (NIT), Karnataka, Surathkal
Principal Investigator
Dr. Rnjeet Kumar sahu
National Institute of Technology (NIT), Karnataka, Surathkal
CO-Principal Investigator
Dr. Hemantha Kumar
National Institute of Technology (NIT), Karnataka, Surathkal
CO-Principal Investigator
Dr. Debashisha Jena
National Institute of Technology (NIT), Karnataka, Surathkal

About

Intelligent Nanostructured Materials (INMs) have gained significant attention for their potential in various applications, including self-healing materials, damping in automobiles, flexible electronics, drug delivery, implants, energy generation, smart textiles, catalysis, and optical fields. INMs are stimuli-responsive nanomaterials that can adapt to varying environmental conditions, such as temperature, mechanical loads, light, pH-value, moisture, electrical charge, and magnetic fields. some methods for synthesizing INMs include sol-gel, solution precipitation, hydration-ultrasonic dispersion, sputtering, track-etching, and micro-emulsion. However, these methods are often difficult to control, have low production rates, and are expensive. There is a need for a simple, compact, versatile, and cost-effective method for synthesizing intelligent nanostructured materials at high yield. This feature calls for a plasma source-based digital nano-manufacturing (PsDNM) method for the synthesis and characterization of intelligent nanostructured materials. The proposed PsDNM is a contactless material removal method based on a plasma column formed between two electrodes - the tool and the workpiece surrounded by a dielectric medium. The material is removed at the nano level through melting and evaporation through electrical discharges.
Funding Organization
Funding Organization
Science and Engineering Research Board (SERB), New Delhi
Anusandhan National Research Foundation (ANRF)
Quick Information
Area of Research
Engineering Sciences
Start Year
2023
End Year
2026
Sanction Amount
₹ 30.24 L
Status
Ongoing
Output
No. of Research Paper
00
Technologies (If Any)
00
No. of PhD Produced
N/A
Startup (If Any)
00
No. of Patents
Filed :00
Grant :00
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