Development of Cu based halides as high-performance transparent conductors for invisible electronics through alloy strategy
Implementing Organization
Mahindra University
Principal Investigator
Prof. Anil Annadi
Mahindra University
Project Overview
The world of electronics is increasingly seeking efficient see-through electronic materials for next-generation devices, such as transparent screens, security cameras, and smart windows. These materials must be electrically conducting and visually transparent, with a band gap above 3.0 eV. Transparent electron (n-type) conductors have superior functionalities, while hole (vacant electron site) conductors (p-type) suffer from low conductivity, mobility, and poor stability. Availability of p-type transparent conductors is essential for advances in transparent electronics, such as in organic LEDs and complementary transistor circuitry. Earth abundant Cu-based halides (CuI type) have received renewed interest due to their excellent transparency and hole conductivity. However, the fundamental issues limiting the performance of Cu halides and p-type materials include high effective mass, low transparency, and difficulty creating stable and large hole density.
This proposal aims to address these issues by designing and developing Cu-based halide alloys by manipulating the fraction of cation/anion atoms in CuI hosts. The project will involve innovative fabrication of Cu halide alloy thin films and property optimization using sputtering/e-beam evaporation processes. Materials characterizations will be carried out using XRD, UV-VIS, Raman spectroscopy, and SEM. The project will also test P-N junction and thin film transistor devices with Cu halides, leading to advancements in technology involving transparent conductors as components.