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Impact of spacer layer in ZnO-based MOSHFET

Implementing Organization

Principal Investigator
Prof. Shaibal Mukherjee
Associate Professor, Indian Institute of Technology Indore (IITI), Indore
CO-Principal Investigator
Dr Vivek Kanhangad
Associate Professor, Indian Institute of Technology Indore (IITI), Indore

Project Overview

The aim and scope of the project are the following: 1. Optimization of deposition and assist ion parameters in the DIBS system while depositing Y2O3 spacer layer in between the substrate and the buffer layer. The impact of thickness, stoichiometric composition, and doping concentration of Y2O3 on the overall device performance will be studied. 2. For the MOSHFET structure, deposition of high-k dielectric materials such as Al2O3 and HfO2 will be attempted to study the impact on the leakage current reduction in the device. 3. Minimizing the off-state leakage currents in MOSHFETs is primordial to their implementation into systems with low-noise and low-power consumptions. 4. Device performance measurement in terms of input and output characteristics will be carried out.
Funding Organization
Funding Scheme
Core Research Grant (CRG)
Quick Information
Area of Research
Life Sciences & Biotechnology
Start Date
2022
Status
ongoing
Contact
shaibal@iiti.ac.in
Output
No. of Research Paper
00
Technologies (If Any)
00
No. of PhD Produced
00
Publications
00
No. of Patents
Filed : 00
Grant : 00
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