Correlating Theoretical Insights Into Pre-Formation Dynamics With Post-Formation Experimental Characterisations Of Atomically Thin Coatings: Applications In Semiconductors And Life-Sciences
Implementing Organization
Indian Institute Of Technology Bombay (IITB), Maharashtra
Principal Investigator
Dr. Chandramouli Subramaniam
Indian Institute Of Technology Bombay (IITB), Maharashtra
CO-Principal Investigator
Prof. Gopalan Rajaraman
Indian Institute Of Technology Bombay (IITB), Mumbai, Maharashtra-400076
Project Overview
To develop the molecular-level chemistry of interactions between active pharmaceutical ingredients and the metal oxide during atomic layer deposition (ALD) techniques. Upon developing this, we aim to identify (i) the presence of impurities, (ii) the infiltration process of ALD precursors (iii) recommend suitable ALD precursors/reaction conditions for API-ALD formulation. To exhaustively characterise atomically thin coatings and (a) Elucidate the structure and compositional uniformity of substrate-coating interface, (b) Quantify the thickness, conformality, bonding and the structure of the substrate-coating interface and (c) Derive a relation between the roughness of the substrate and that of coating.
Source
Source
Science and Engineering Research Board (SERB), DST 2022-23
Indian Institute Of Technology Bombay (IITB), Maharashtra
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